Company Performance Metrics
Canon Nanotechnologies was originally founded as Molecular Imprints, Inc. (MII) in Austin, Texas in 2001, a spin out from the University of Texas. Canon Nanotechnologies has applied for over 700 patents, resulting in a growing portfolio of over 170 patents issued covering imprint tools, imprint materials and masks/templates, process technology
and imprint-specific device designs. Jet and Flash Imprint Lithography (J-FIL), powered by our Drop Pattern Generator system, is the heart of Canon Nanotechnologies’ advanced nanoimprint technology, allowing precise placement of UV curable imprint resist on substrates in picoliter quantities, enabling uniform and consistent nanoimprinting of features down to 10nm and below at very low cost. Canon Nanotechnologies delivers this value to customers through integration of a unique set of core competencies and partnerships that cover lithography, precision nanomechanics, fluid dynamics, surface chemistry and materials formulation.
