82
64
Growth Score 82 in past quarter
-2 pts
Heat Score 64 in past quarter
-8 pts
Company Performance Metrics
Score
Trend
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Growth Score - The measure of growth based on company activity, operational metrics, and investments
Growth Trend - The change in the growth score over the given time period
Heat Score - The measure of the market interest, media activity, and Crunchbase profile activity
Heat Trend - The change in the heat score over the given time period
Recent Milestones
Raised Funding Round
Jan 1, 1970
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Raised Funding Round
Jan 1, 1970
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Raised Funding Round
Jan 1, 1970
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1651096
Helyssen produces high efficiency inductively coupled and wave heated RF plasma sources.
About the Company
Based on its unique proprietary technology, Helyssen has developed the world’s most advanced and versatile inductive plasma source.
Dr Philippe Guittienne founded Helyssen in 2003 to develop and commercialize application licenses on proprietary technologies. Since inception, Helyssen research lab is located in the Swiss plasma center (SPC) in
EPFL and collaborate closely with Ivo Furno’s industrial plasma group.
Helyssen focuses on designing high efficiency inductively coupled and wave heated RF plasma sources.